Mitsunobu Koshiba: search on Z-Library

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1

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Aqueous base developable novel deep-UV resist for KrF excimer laser lithography

Murata, Makoto, Takahashi, Toshihiko, Koshiba, Mitsunobu, Kawamura, Shin-ichi, Yamaoka, Tsuguo, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 245 KB

english, 1990

2

A novel positive resist for deep UV lithography

Tsuguo Yamaoka, Masashi Nishiki, Ken'Ichi Koseki, Mitsunobu Koshiba

Journal:

Polymer Engineering & Science

Year:

1989

Language:

english

File:

PDF, 208 KB

english, 1989

3

Dynamic mechanical properties of photopolymerizable poly(vinyl alcohol)–acrylate monomer blends

Mitsunobu Koshiba, Tsuguo Yamaoka, Takahiro Tsunoda

Journal:

Journal of Applied Polymer Science

Year:

1983

Language:

english

File:

PDF, 442 KB

english, 1983

4

Dissolution inhibition mechanisms of naphthoquinone diazides

Mitsunobu Koshiba, Makoto Murata, Yoshiyuki Harita, Tsuguo Yamaoka

Journal:

Polymer Engineering & Science

Year:

1989

Language:

english

File:

PDF, 273 KB

english, 1989

5

Properties of ultra-violet curable polyurethane acrylates

Mitsunobu Koshiba, Kirk K. S. Hwang, Sandra K. Foley, David J. Yarusso, Stuart L. Cooper

Journal:

Journal of Materials Science

Year:

1982

Language:

english

File:

PDF, 841 KB

english, 1982

6

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - Thermally Induced And Base Catalyzed Reactions Of Naphthoquinone Diazides

Koshiba, Mitsunobu, Murata, Makoto, Matsui, Mariko, Harita, Yoshiyuki, MacDonald, Scott A.

Year:

1988

Language:

english

File:

PDF, 299 KB

english, 1988

7

10.1295/koron.37.227

KOSHIBA, Mitsunobu, YAMAOKA, Tsuguo, TSUNODA, Takahiro

Journal:

KOBUNSHI RONBUNSHU

Year:

1980

File:

PDF, 1.25 MB

1980

8

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Mechanisms Of The Dissolution Inhibition Effect And Their Application To Designing Novel Deep-UV Resists

Murata, Makoto, Koshiba, Mitsunobu, Harita, Yoshiyuki, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 1.79 MB

english, 1989

9

A Novel Positive Resist for Deep UV Lithography

Nishiki, Masashi, Yamaoka, Tsuguo, Koseki, Ken'ichi, Koshiba, Mitsunobu

Journal:

Journal of Photopolymer Science and Technology

Year:

1988

Language:

english

File:

PDF, 81 KB

english, 1988

10

Study of photopolymers. XXXIII. Chemical modification of poly(epichlorohydrin) and its application as photosensitive polymers

Tadatomi Nishikubo, Tsutomu Shimokawa, Takeshi Fujii, Takashi Iizawa, Yoshiyuki Harita, Mitsunobu Koshiba

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1988

Language:

english

File:

PDF, 1.03 MB

english, 1988

11

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Application Of Halogenated Polymethylstyrenes To X-Ray Resists

Yamaoka, Tsuguo, Koshiba, Mitsunobu, Kamoshida, Yoichi, Takahashi, Hideo, Harita, Yoshiyuki, Bowden, Murrae J.

Year:

1987

Language:

english

File:

PDF, 7.10 MB

english, 1987

12

10.1246/nikkashi.1984.200

KOSHIBA, Mitsunobu, YOKOYAMA, Yasuaki, KAMOSHIDA, Yoichi, HARITA, Yoshiyuki

Journal:

NIPPON KAGAKU KAISHI

Year:

1984

File:

PDF, 1.55 MB

1984

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